Tungsten targets introduction
1, Appearance: Silver white metal luster
2, Purity: W≥99.95%
3, Density: not less than 19.1g/cm3
4, Supply state: Surface polishing, CNC machine processing
5, Quality standards: GB/T 3875-2006 (tungsten plate)
Specifications of Tungsten targets
Thickness | Width | Length | Parallelism | Verticality | Surface finish | |
Tungsten target | 8.0~16.0 | 10~450 | 10~500 | <0.05 | <2o |
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3.0~8.0 | 10~450 | 10~800 | <0.05 | <2o |
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1.0~3.0 | 10~450 | 10~1200 | <0.05 | <2o |
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Production process Tungsten target
Production equipments
Applications of Tungsten targets
Tungsten target is mainly used in plasma sputtering industry.With the electric field, electron collided with the argon atom when fly to the substrate, then argon atoms and electrics were ionized .The electrics fly to the substrate while argon atoms accelerate to bomb the target, the neutral atoms (or molecules) in the target deposit on the substrate and become the coating.
Since the tungsten resistant to high temperature and corrosion, tungsten targets are widely used in petroleum chemical industry, aviation, machine manufacturing, and electronics semiconductor industries and so on.
We can provide tungsten target that made with tungsten powder which purity is 99.95%. High quality products have been made after decades of procedures such as pressing, sintering, rolling, cutting and surface grinding. Super sputtering target (single heavy reach to 100kg) is available at present.